دسترسی نامحدود
برای کاربرانی که ثبت نام کرده اند
برای ارتباط با ما می توانید از طریق شماره موبایل زیر از طریق تماس و پیامک با ما در ارتباط باشید
در صورت عدم پاسخ گویی از طریق پیامک با پشتیبان در ارتباط باشید
برای کاربرانی که ثبت نام کرده اند
درصورت عدم همخوانی توضیحات با کتاب
از ساعت 7 صبح تا 10 شب
ویرایش: نویسندگان: J.P. Hirtz, C. Whitehouse, H.P. Meier, H.J. von Bardeleben and M.O. Manasreh (Eds.) سری: European Materials Research Society Symposia Proceedings 40 ISBN (شابک) : 9780444817693 ناشر: North Holland سال نشر: 1993 تعداد صفحات: 352 زبان: English فرمت فایل : PDF (درصورت درخواست کاربر به PDF، EPUB یا AZW3 تبدیل می شود) حجم فایل: 34 مگابایت
در صورت تبدیل فایل کتاب Semiconductor Materials for Optoelectronics and LTMBE Materials, PROCEEDINGS OF SYMPOSIUM A ON SEMICONDUCTOR MATERIALS FOR OPTOELECTRONIC DEVICES, OEICS AND PHOTONICS AND SYMPOSIUM B ON LOW TEMPERATURE MOLECULAR BEAM EPITAXIAL III–V MATERIALS: PHYSICS AND APPLICATIONS OF THE 1993 E-MRS SPRING CONFERENCE به فرمت های PDF، EPUB، AZW3، MOBI و یا DJVU می توانید به پشتیبان اطلاع دهید تا فایل مورد نظر را تبدیل نمایند.
توجه داشته باشید کتاب مواد نیمه رسانا برای اپتوالکترونیک و مواد LTMBE ، مراحل انجام سمپوزیوم A در مواد نیمه هادی دستگاههای اپتوالکترونیک ، ائیک و فتونیک و نمک B نسخه زبان اصلی می باشد و کتاب ترجمه شده به فارسی نمی باشد. وبسایت اینترنشنال لایبرری ارائه دهنده کتاب های زبان اصلی می باشد و هیچ گونه کتاب ترجمه شده یا نوشته شده به فارسی را ارائه نمی دهد.
سمپوزیوم B به لایه های همپای III-V می پردازد که توسط اپیتاکسی پرتو مولکولی در دمای پایین رشد کرده اند، موضوعی که در سه سال اخیر توسعه سریعی داشته است.
Symposium B dealt with III-V epitaxial layers grown by low temperature molecular beam epitaxy, a subject which has undergone rapid development in the last three years
Content:
European Materials Research Society Symposia Proceedings
Page ii
Front Matter
Page iii
Copyright page
Page iv
Preface
Page xi
J.P. Hirtz, H. Meier, C. Whitehouse
Organizers and Sponsors
Page xii
Preface
Page i
H.J. von Bardeleben, J.P. Hirtz, M.O. Manasreh
Organizers and Sponsors
Page ii
Stoichiometry of III–V compounds
Pages 107-119
Jun-ichi Nishizawa
Evaluation of III–V growth technologies for optoelectronic applications
Pages 120-129
Harald Heinecke, Eberhard Veuhoff
Selective and non-planar epitaxy of InP/GaInAs(P) by MOCVD
Pages 130-146
E.J. Thrush, J.P. Stagg, M.A. Gibbon, R.E. Mallard, B. Hamilton, J.M. Jowett, E.M. Allen
Esprit Morse: research for novel metal–organic precursors
Pages 147-152
F. Scholz
MBE regrowth of GaAs/AlGaAs structures on RIE patterned substrates
Pages 153-156
T. Röhr, M. Walther, S. Rochus, G. Böhm, W. Klein, G. Tränkle, G. Weimann
Improved method for GaAs-(Ga, Al) As epitaxial regrowth
Pages 157-160
E. Bedel, A. Munoz-Yague, C. Fontaine, C. Vieu
Investigation of MOVPE-grown In0.53Ga0.47As/InP multi-quantum wells by Raman spectroscopy and X-ray diffractometry
Pages 161-164
J. Finders, M. Keuter, D. Gnoth, J. Geurts, J. Woitok, A. Kohl, R. MГјller, K. Heime
Chemical beam epitaxy of high purity InP using tertiarybutylphosphine and 1,2 bis-phosphinoethane
Pages 165-168
M. Zahzouh, G. Hincelin, R. Mellet, A.M. Pougnet
Optical characterization of extremely high purity ZnSe grown by metal–organic vapour phase epitaxy using dimethylzinc-triethylamine adduct
Pages 169-173
T. Cloitre, N. Briot, O. Briot, B. Gil, R.L. Aulombard, A.C. Jones
Spectroscopic ellipsometry: a useful tool to determine the refractive indices and interfaces of In0.52Al0.48As and In0.53AlxGa0.47 – xAs layers on InP in the wavelength range 280–1900 nm
Pages 174-176
H.W. Dinges, H. Burkhard, R. Lösch, H. Nickel, W. Schlapp
Room temperature photoreflectance as a powerful tool to characterize the crystalline quality of InAlAs layers grown on InP substrates
Pages 177-180
S. MonГ©ger, A. Tabata, C. Bru, G. Guillot, A. Georgakilas, K. Zekentes, G. Halkias
Effects of deep levels and Si-doping on GaInP material properties investigated by means of optical methods
Pages 181-184
Q. Liu, U. Quedeweit, F. Scheffer, A. Lindner, W. Prost, F.J. Tegude
Optical properties of GaSb–AlSb heterostructures grown by molecular beam epitaxy
Pages 185-188
B. Lambert, Y. Toudic, Y. Rouillard, M. Baudet, B. Guenais, B. Deveaud, I. Valiente, J.C. Simon
Absorption coefficient and exciton oscillator strengths in InGaAs/InP multi-quantum wells
Pages 189-193
C. Arena, L. Tarricone, F. Genova, C. Rigo
MBE growth and properties of high quality Al(Ga)InAs/GaInAs MQW structures
Pages 194-197
H. Künzel, J. Böttcher, A. Hase, C. Schramm
Influence of the cap layer thickness on the optical properties of near surface GaInAs/GaAs quantum wells
Pages 198-200
J. Dreybrodt, F. Faller, A. Forchel, J.P. Reithmaier
Intersubband transitions in InAs/AlSb quantum wells
Pages 201-204
A. Simon, J. Scriba, C. Gauer, A. Wixforth, J.P. Kotthaus, C.R. Bolognesi, C. Nguyen, G. Tuttle, H. Kroemer
Blue diode lasers and visible optoelectronic devices
Pages 205-210
B.C. Cavenett, K.A. Prior, S.Y. Wang
Aluminium-free 980 nm laser diodes
Pages 211-216
M. Pessa, J. Näppi, G. Zhang, A. Ovtchinnikov, H. Asonen
Shadow mask MBE for the fabrication of lead chalcogenide buried heterostructure lasers
Pages 217-223
A. Lambrecht, R. Kurbel, M. Agne
Quantum confined Stark effect (QCSE) and self-electro-optic effect device (SEED) in II-VI heterostructures
Pages 224-227
H. Haas, P. Gentile, N. Magnea, J.L. Pautrat, Le Si Dang, N.T. Pelekanos
Growth of InAlGaAs multilayer structures for high power and submilliamp vertical cavity lasers
Pages 228-231
K. Panzlaff, T. Hackbarth, E. Zeeb, T. Wipiejewski, K.J. Ebeling
p-Dopant incorporation and influence on gain and damping behaviour in high-speed GaAs-based strained MQW lasers
Pages 232-236
J.D. Ralston, S. Weisser, I. Esquivias, A. Schönfelder, E.C. Larkins, J. Rosenzweig, P.J. Tasker, M. Maier, J. Fleissner
Experimental and theoretical studies of multi-quantum well structures for unipolar avalanche multiplication
Pages 237-240
Mika Toivonen, Marko Jalonen, Markus Pessa, Kevin R. Lefebvre, Neal G. Anderson
Lateral thickness modulations in alternate tensile–compressive strained GaInAsP multilayers grown by gas source molecular beam epitaxy
Pages 241-243
A. Ponchet, A. Rocher, J.Y. Emery, C. Starck, L. Goldstein
Growth and characterization of In0.53Ga0.47As/InxGa1–xAs strained-layer superlattices
Pages 244-248
A. Kohl, S. Juillaguet, B. Fraisse, R. Schwedler, F. Royo, H. Peyre, F. Bruggeman, K. Wolter, K. Leo, H. Kurz, J. Camassel
Metal–organic vapour-phase epitaxial growth of symmetrically strained (GaIn)As/Ga(PAs) superlattices
Pages 249-252
S. Lutgen, T. Marschner, T.F. Albrecht, W. Stolz, E.O. Göbel, L. Tapfer
Strain effects on carrier lifetimes in InGaAs/(Al)GaAs multiple quantum wells
Pages 253-256
M.H. Moloney, J. Hegarty, L. Buydens, P. Demeester, R. Grey, J. Woodhead
Determination of residual strain by reflectivity, X-ray diffraction and Raman spectroscopy in ZnSe epilayers grown on GaAs(001), InP(001) and GaSb(001) by metal–organic vapor phase epitaxy
Pages 257-261
M. Stoehr, M. Maurin, F. Hamdani, J.P. Lascaray, D. Barbusse, B. Fraisse, R. Fourcade, P. Abraham, Y. Monteil
Characterization of heterointerfaces and surfaces in InSb on GaAs and in InAs/AlSb quantum wells
Pages 262-265
J. Wagner, J. Schmitz, A.-L. Alvarez, P. Koidl, J.D. Ralston
Improvements in the heteroepitaxial growth of GaAs on Si by MOVPE
Pages 266-269
T. Marschner, W. Stolz, E.O. Göbel, F. Phillipp, M. Müller, J. Lorberth
Characterization of the heterostructure between heteroepitaxially grown ОІ-FeSi2 and (111) silicon
Pages 270-273
M. Pauli, M. Dücker, M. Döscher, J. Müller, W. Henrion, H. Lange
Optical investigation of interdiffusion in CdTe/CdMnTe quantum wells
Pages 274-276
D. Tönnies, G. Bacher, A. Forchel, A. Waag, G. Landwehr
Investigation of InGaAs/InP interdiffusion by simultaneous transmission electron microscopy and photoluminescence analysis
Pages 277-280
J. Oshinowo, A. Forchel, J.D. GaniГЁre, P. Ruterana, P.A. Stadelmann, I. Gyuro, G. Laube, E. Zielinski
Vacancy controlled interdiffusion in III–V heterostructures
Pages 281-283
W.P. Gillin, I.V. Bradley, S.S. Rao, K.P. Homewood, B.J. Sealy, L.K. Howard, A.D. Smith, A.T.R. Briggs
Simulation of lateral Al recoil atoms and damage defects gradients in a GaAs/GaAlAs quantum well created by masked ion implantation
Pages 284-287
M.M. Faye, C. Vieu, L. LaГўnab, J. Beauvillain, A. Claverie
Strained InAs/AlxGa0.48–xIn0.52As heterostructures: a tunable quantum well materials system for light emission from the near-IR to the mid-IR
Pages 288-292
Eric TourniГ©, Klaus H. Ploog, Patrick Grunberg, Shata Kadret, AndrГ© JoulliГ©, Franz Daiminger, L. Butov, Alfred Forchel
Chemical beam epitaxy and photoluminescence characteristics of InGaAsP/InP BRAQWET modulators
Pages 293-295
J.F. Carlin, B. Dwir, M. Glick, R. Monnard, A. Rudra, M.A. Dupertuis, F.K. Reinhart
Second harmonic generation via excitations between valence sub-bands in p-type GaAs–AlAs and Si–SiGe quantum well structures
Pages 296-299
K.B. Wong, M.J. Shaw, M. Jaros
An AlGaAs/GaAs OEIC structure for the integration of LEDs, MESFETs and photodetectors
Pages 300-303
D. Leipold, U. Kehrli, B. Delley, K. Thelen, B.D. Patterson
AlGaInP/GaInAs/GaAs MODFET devices: candidates for optoelectronic integrated circuits
Pages 304-306
W. Pletschen, K.H. Bachem, P.J. Tasker, K. Winkler
Photoluminescence and electroluminescence processes in Si1–xGex/Si heterostructures grown by chemical vapor deposition
Pages 307-311
J.C. Sturm, X. Xiao, Q. Mi, C.W. Liu, A.St. Amour, Z. Matutinovic-Krstelj, L.C. Lenchyshyn, M.L.W. Thewalt
Tunable infrared photoemission sensor on Si using epitaxial ErSi2/Si heterostructures
Pages 312-316
I. Sagnes, Y. Campidelli, G. Vincent, P.A. Badoz
A study of PbSe heteroepitaxy on Si(111) for IR optoelectronic applications
Pages 317-320
F. Nguyen-Van-Dau, V. Mathet, P. Galtier, G. Padeletti, J. Olivier, D.G. CrГ©tГ©, P. Collot
Optical cross-sections and distribution of Fe2+ and Fe3+ in semi-insulating liquid encapsulated Czochralski grown InP:Fe
Pages 321-324
A. Seidl, F. Mosel, J. Friedrich, U. Kretzer, G. MГјller
Large negative persistent photoconductivity of bulk GaAs1–xPx (x = 0.02–0.03) single crystals
Pages 325-328
T. SЕ‚upiЕ„ski, G. Nowak, R. BoЕјek, A. WysmoЕ‚ek, M. Baj
Synthetic diamond: the optical band at 1.883 eV
Pages 329-332
M.H. NazarГ©, L.M. Rino
Optical and transport properties in the electro-optical material CdIn2Te4
Pages 333-337
G. Couturier, B. Jean, J.F. Lambert, P. Joffre
Basic principles governing the surface atomic structure of zinc blende semiconductors
Pages 1-8
M. Lannoo
LTMBE GaAs: present status and perspectives
Pages 9-15
Gerald L. Witt
Point defects in III–V materials grown by molecular beam epitaxy at low temperature
Pages 16-22
P. Hautojärvi, J. Mäkinen, S. Palko, K. Saarinen, C. Corbel, L. Liszkay
Gallium vacancy related defects in silicon doped GaAs grown at low temperatures
Pages 23-26
S.A. McQuaid, R.E. Pritchard, R.C. Newman, S. O\'Hagan, M. Missous
EL2-like defects in low temperature GaAs
Pages 27-30
G. Kowalski, A. Kurpiewski, M. KamiЕ„ska, E.R. Weber
GaAs, AlGaAs, and InGaAs epilayers containing As clusters: semimetal/semiconductor composites
Pages 31-36
M.R. Melloch, J.M. Woodall, N. Otsuka, K. Mahalingam, C.L. Chang, D.D. Nolte
Semi-insulating GaAs made by As implantation and thermal annealing
Pages 37-40
A. Claverie, F. Namavar, Z. Liliental-Weber, P. Dreszer, E.R. Weber
Electro-optical measurement of low temperature GaAs
Pages 41-44
K.P. Korona, M. KamiЕ„ska, J.M. Baranowski, E.R. Weber
Extended defects and precipitates in LT-GaAs, LT-InAlAs and LT-InP
Pages 45-54
Alain Claverie, Zuzanna Liliental-Weber
Interfacial barrier characteristics of LT-GaAs on low doped GaAs layers
Pages 55-60
K.M. Lipka, B. Splingart, X. Zhang, M. Poese, K. Panzlaff, E. Kohn
Optoelectronic applications of LTMBE III-V materials
Pages 61-67
John F. Whitaker
Subpicosecond electric field dynamics in low-temperature-grown GaAs observed by reflective electro-optic sampling
Pages 68-71
T. Dekorsy, X.Q. Zhou, K. Ploog, H. Kurz
Applications of GaAs grown at a low temperature by molecular beam epitaxy
Pages 72-77
Umesh K. Mishra
Temperature measurements of LT GaAs diodes
Pages 78-81
R. Westphalen, B. Boudart, D. ThГ©ron, X. Wallart, Y. Druelle, Y. Crosnier
Noise studies of HFETs on low temperature grown GaAs buffers and of MESFETs with low temperature grown GaAs passivation
Pages 82-85
A.D. van Rheenen, Y. Lin, S. Tehrani, C.-L. Chen, F.W. Smith
Electrical conduction in low temperature grown InP
Pages 86-88
K. Khirouni, H. Maaref, J.C. Bourgoin, J.C. Garcia
Low temperature molecular beam epitaxy of Al(Ga)InAs on InP and its application to high electron mobility transistor structures
Pages 89-92
H. Künzel, J. Böttcher, A. Hase, C. Heedt, H. Hoenow
Photo-induced current transient spectroscopy of Al0.48In0.52As semi-insulating layers grown on InP by molecular beam epitaxy
Pages 93-96
A. Kalboussi, G. Marrakchi, A. Tabata, G. Guillot, G. Halkias, K. Zekentes, A. Georgakilas, A. Cristou
Low temperature chemical beam epitaxy of gallium phosphide/silicon heterostructures
Pages 97-102
J.T. Kelliher, J. Thornton, N. Dietz, G. Lucovsky, K.J. Bachmann
Author Index of Volume 21, Issues 2–3
Pages 338-339
Subject Index of Volume 21, Issues 2–3
Pages 340-345
Author Index of Volume 22, Number 1
Page 103
Subject Index of Volume 22, Number 1
Pages 104-106