Scanning Probe Lithography: Fundamentals, Materials, and Applications

Cover
Half Title
Series
Title
Copyright
Dedication
Contents
Acknowledgements
Author Biographies
Acronyms
Chapter 1 Historical Background and Place in the Lithography Roadmap
	1.1. Introduction to Nanolithography by AFM
	1.2. Historical Background
	1.3. AFM: The Most Versatile Tool at the Nanoscale
	1.4. Book Scheme
	Chapter References
Chapter 2 Basic Concepts and Modalities
	2.1. The Tool: An Atomic Force Microscope
	2.2. An Atomic Force Microscope for Lithography
	2.3. Preparing a Scanning Probe Lithography Experiment
	2.4. “How to Name the Technique?”
	Chapter References
Chapter 3 Mechanical Scanning Probe Lithography
	3.1. Fundamentals
	3.2. Parameters for the Lithographic Process
	3.3. Manipulation of Nano-Objects
	3.4. Cleaning of 2D Materials Post-Processing
	3.5. Applications and Proof of Concepts
		3.5.1. Lift-Off and Pattern Transfer Processes
		3.5.2. Templates
		3.5.3. Charge Modulation in Quantum Devices
		3.5.4. 2D Materials Based Devices and Patterns
		3.5.5. Other Proof-of-Concept Devices and Nanostructures
	Chapter References
Chapter 4 Dip Pen Nanolithography
	4.1. Fundamentals
		4.1.1. Type of Inks
		4.1.2. Material Transport Models
			(a) Molecular Diffusion in the Case of Diffusive Inks
			(b) Mass Fluid Flow in the Case of Liquid Inks
		4.1.3. Derivatives of Dip Pen Nanolithography Method
		4.1.4. Developments on the Tool
	4.2. Parameters for the Lithographic Process
		4.2.1. Tip
		4.2.2. Surface
		4.2.3. Ink
		4.2.4. Writing Conditions
	4.3. Electrochemical and Thermal Dip Pen Nanolithography
	4.4. Applications
		4.4.1. Etching Masks and Chemical Templates
		4.4.2. Biomolecular or Organic Molecule Patterns
		4.4.3. Inorganic Patterns
	Chapter References
Chapter 5 Field Emission Scanning Probe Lithography
	5.1. Fundamentals
	5.2. Parameters for the Lithographic Process
	5.3. Towards Single-Digit Nanometer Lithography
	5.4. Other Processes Driven by fe-SPL
	Chapter References
Chapter 6 Oxidation Scanning Probe Lithography
	6.1. Fundamentals
		6.1.1. Oxide Growth Kinetics
		6.1.2. Composition of the Oxides Fabricated by o-SPL
		6.1.3. Growth of Oxides over and under the Substrate Surface
	6.2. Parameters for the Lithographic Process
	6.3. Tunability of o-SPL Processes: Polarity and Atmosphere
	6.4. Applications and Proof of Concepts
		6.4.1. Lift-Off and Pattern Transfer Processes
		6.4.2. Templates
		6.4.3. Barriers for Quantum Devices
		6.4.4. Control over Metallic/Insulating State Transitions
		6.4.5. 2D Materials Based Devices and Patterns
		6.4.6. Other Proof-of-Concept Devices and Nanostructures
	Chapter References
Chapter 7 Thermal Scanning Probe Lithography
	7.1. Fundamentals and Components of the Tool
	7.2. From the Millipede to the NanoFrazor
		7.2.1. The Cantilever
		7.2.2. The Tool and the Technique
		7.2.3. The Resist
		7.2.4. Markless Lithography
	7.3. Parameters for the Lithographic Process
	7.4. Applications and Proof of Concepts
		7.4.1. Lift-Off and Pattern Transfer Processes
		7.4.2. Etching Masks and Templates
		7.4.3. Three-Dimensional Structures
		7.4.4. 2D Materials
		7.4.5. Physical and Chemical Conversion
	Chapter References
Chapter 8 Lithography Using a Scanning Tunneling Microscope
	8.1. Fundamentals and Parameters
	8.2. Manipulation of Atoms and Molecules
		8.2.1. Parallel Processes
		8.2.2. Perpendicular Processes
		8.2.3. Hydrogen Depassivation Lithography and Atomically Precise Manufacturing
	8.3. Scanning Proximal Probe Lithography
	Chapter References
Chapter 9 High-Throughput Strategies
	9.1. Array of Cantilevers
	9.2. Soft/Hard Stamps
	9.3. Mix and Match Lithography
	Chapter References
Index