Ion Implantation and Beam Processing

Content: 
Front Matter, Page iii
Copyright, Page iv
CONTRIBUTORS, Pages ix-x, H.H. Andersen, B.R. Appleton, J.E.E. Baglin, D.G. Beanland, W.L. Brown, L.A. Christel, J.A. Davies, F.H. Eisen, J.F. Gibbons, H.B. Harrison, A.E. Michel, J.M. Poate, H.S. Rupprecht, J.L. Tandon, J.S. Williams
PREFACE, Page xi
CHAPTER 1 - Introduction to Implantation and Beam Processing, Pages 1-11, J.S. WILLIAMS, J.M. POATE
CHAPTER 2 - Amorphization and Crystallization of Semiconductors, Pages 13-57, J.M. POATE, J.S. WILLIAMS
CHAPTER 3 - Application of the Boltzmann Transport Equation to Ion Implantation in Semiconductors and Multilayer Targets, Pages 59-79, J.F. GIBBONS, L.A. CHRISTEL
CHAPTER 4 - High Energy Density Collision Cascades and Spike Effects, Pages 81-97, J.A. DAVIES
CHAPTER 5 - Implantation of Insulators: Ices and Lithographic Materials, Pages 99-126, W.L. BROWN
CHAPTER 6 - Ion-Bombardment-Induced Composition Changes in Alloys and Compounds, Pages 127-187, HANS HENRIK ANDERSEN
CHAPTER 7 - Ion Beam and Laser Mixing: Fundamentals and Applications, Pages 189-259, B.R. APPLETON
CHAPTER 8 - High-Dose Implantation, Pages 261-309, D.G. BEANLAND
CHAPTER 9 - Trends of Ion Implantation in Silicon Technology, Pages 311-326, H.S. RUPPRECHT, A.E. MICHEL
CHAPTER 10 - Implantation in GaAs Technology, Pages 327-355, F.H. EISEN
CHAPTER 11 - Contacts and Interconnections on Semiconductors, Pages 357-409, J.E.E. BAGLIN, H.B. HARRISON, J.L. TANDON, J.S. WILLIAMS
INDEX, Pages 411-419