Current Topics in Amorphous Materials. Physics & Technology

Content: 
Front Matter, Page iii
Copyright, Page iv
Preface, Page v, Yoshifumi Sakurai
Introduction, Page 3, Kenji Suzuki
Static structure of amorphous solids and liquids by pulsed neutron diffraction, Pages 4-13, M. Misawa, T. Fukunaga
Characterization of the environmental structure of disordered materials using anomalous X-ray scattering, Pages 14-21, Eiichiro Matsubara, Yoshio Waseda
Characterization of the medium-range dynamic structure of palladium-metalloid amorphous alloys by pulsed neutron inelastic scattering, Pages 22-28, Kenji Suzuki, Kaoru Shibata
Structural fluctuation in microclusters, Pages 29-38, M. Doyama, H. Matsui, H. Matsuaoka, T. Uchida, T. Hirokawa
Medium-range atomic ordering in amorphous alloys studied by high-resolution electron microscopy, Pages 39-46, Yoshihiko Hirotsu, Kazunori Anazawa
Medium-range structure and relaxation in chalcogenide glasses investigated by Raman scattering, Pages 47-58, Kazuo Murase, Koichi Inoue, Osamu Matsuda
Topological disorder in medium-range structure of amorphous solids and quasicrystals, Pages 59-64, Toshiyuki Ninomiya
Structure and properties of quasicrystals, Pages 65-73, Shin Takeuchi
A unified picture for electron scattering mechanisms in amorphous alloys and quasicrystals, Pages 74-89, Uichiro Mizutani
Electronic states and chemical bonds in amorphous alloys, Pages 90-97, Kazuhide Tanaka
Current topics in the magnetism of amorphous transition metals and alloys, Pages 98-108, K. Fukamichi
Amorphous metals, Page 111, Tsuyoshi Masumoto
Solid state amorphization by hydrogen absorption, Pages 112-119, Kiyoshi Aoki, Tsuyoshi Masumoto
Solid-state amorphization by irradiation, Pages 120-126, Hirotaro Mori
Solid-state amorphization: interdiffusion of multilayers, Pages 127-134, Makoto Matsuura
Amorphization by chemical reduction, Pages 135-136, Junji Saida
Amorphous plating, Pages 137-149, Tohru Watanabe
Atomized powders and consolidation, Pages 150-158, Akihisa Inoue, Tsuyoshi Masumoto
Light-metal based amorphous alloys, Pages 159-166, Akihisa Inoue, Tsuyoshi Masumoto
Chemical properties — corrosion, electrochemistry and catalysis, Pages 167-176, Koji Hashimoto
Nanocrystalline alloys produced by crystallization of amorphous alloys, Pages 177-184, Akihisa Inoue, Tsuyoshi Masumoto
Application of amorphous superconductors to liquid-helium level indicators, Pages 185-190, Uichiro Mizutani, T. Oka, A. Inoue, T. Masumoto
Mechanical application, Pages 191-195, Michiaki Hagiwara
Introduction, Pages 199-200, Y. Sakurai
Amorphous ribbon, Pages 201-205, Masaaki Yagi
Amorphous wire, Pages 206-210, Isamu Ogasawara, Shuji Ueno
Soft magnetic film, Pages 211-215, Yutaka Shimada
Amorphous RE–TM film, Pages 216-220, S. Uchiyama, T. Kobayashi
Garnet film, Pages 221-224, Akiyoshi Itoh
Giant magnetic moment of epitaxially grown Fe16N2 films, Pages 225-226, Y. Sugita, M. Komuro, K. Mitsuoka
Oxide magnetic film, Pages 227-233, M. Abe
Super fine crystal material, Pages 234-238, Y. Yoshizawa, K. Yamauchi
Hard magnetic materials, Pages 239-243, Akira Higuchi
Artificial superstructure films, Pages 244-248, T. Shinjo, K. Mibu, N. Hosoito
Ion-implanted film, Pages 249-252, Yasuo Gondō
Magneto-optic memory, Pages 253-257, S. Hashimoto, K. Aso
Perpendicular magnetic rigid disks, Pages 258-264, Tatsuo Ozeki, Toshiya Sakata, Shinsuke Yura
Magnetic heads, Pages 265-271, Hiroshi Sakakima
Amorphous transformers, Pages 272-277, Takashi Sato
Micro-magnetic devices, Pages 278-283, K. Shirae
Sensors, Pages 284-293, K. Mohri
Power devices, Pages 294-298, Tsutomu Chou, Yoshikazu Narumiya
Introduction, Pages 301-311, Yoshihiro Hamakawa
NMR studies of a-Si: H, Pages 312-317, Shigenobu Hayashi
ESR characterization, Pages 318-322, Tatsuo Shimizu
ENDOR and ODMR characterization, Pages 323-328, Kazuo Morigaki
First principles of the molecular-dynamics study of light-induced defect formation in a-Si: H, Pages 329-333, Fumiko Yonezawa
Implications of electroabsorption spectra for band edge parameters in amorphous silicon, Pages 334-338, Hiroaki Okamoto
Dispersive photoresponse in phosphorus-doped hydrogenated amorphous silicon, Pages 339-344, Hidetoshi Oheda
Mechanism of plasma chemical-vapor deposition of hydrogenated amorphous silicon, Pages 345-350, Akihisa Matsuda
ECR CVD, Pages 351-356, Yutaka Hattori
Delta doping in a-Si devices, Pages 357-362, Makoto Konagai
Ultrathin film and superlattices, Pages 363-368, Kiminori Hattori
Bandgap profiling of stacked solar cells, Pages 369-376, Yukihiko Nakata
Light-induced effects in a-Si solar cells, Pages 377-383, H. Yamagishi, Y. Tawada
Amorphous silicon solar cells, Pages 384-390, Yukinori Kuwano
a-Si stacked solar cells, Pages 391-394, Kazuhiko Sato
Large-area a-Si solar cell production, Pages 395-402, Hiroshi Sakai, Yukumi Ichikawa
a-Si TFT and applications, Pages 403-409, Shunsuke Tomiyama
a-Si photoreceptor, Pages 410-414, Shigeru Shirai, Isamu Kajita
Light-emitting device, Pages 415-420, Masashi Yoshimi
HARPICON: A highly sensitive TV pickup tube with avalanche multiplication mode, Pages 421-424, Eiichi Maruyama
Subject index, Pages 425-432