The Physics and Chemistry of SiO2 and the Si-SiO2 Interface

Front Matter....Pages i-xiii
Front Matter....Pages 1-3
Historical Perspectives of Silicon Oxidation....Pages 5-16
Oxidation of Silicon: Tests of Mechanisms....Pages 17-23
Silicon Oxidation Models Based on Parallel Mechanisms....Pages 25-34
The Role of SiO in Si Oxidation at a Si-SiO 2 Interface....Pages 35-42
Uncertainty Analysis of Analytic Oxidation Models....Pages 43-51
Modeling of the Oxide Growth in a Chlorine Ambient....Pages 53-59
Silicon Oxidation Studies: A Review of Recent Studies on Thin Film Silicon Dioxide Formation....Pages 61-74
Si Oxidation Mechanisms as Studied by Oxygen Tracer Methods....Pages 75-84
The Oxidation of Silicides on Silicon....Pages 85-94
Oxidation Kinetics of Si in Dry CO 2 ....Pages 95-102
A Novel Silicon Oxidation Method — HF Enhanced Oxidation....Pages 103-110
Thermal Oxidation of Silicon in an Afterglow Gas....Pages 111-117
Deposition of SiO 2 Thin Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)....Pages 119-127
Anodic SiO 2 for Low Temperature Gate Dielectrics....Pages 129-136
Front Matter....Pages 137-138
Local Atomic Structure of Thermally Grown SiO 2 Films....Pages 139-148
Structural Relaxation and Growth of SiO 2 Films on Si....Pages 149-157
Structural Relaxation Effects in Dry Thermal Silicon Dioxide Films on Silicon....Pages 159-167
Molecular Diffusion in a-SiO 2 : Its Role in Annealing Radiation-Induced Defect Centers....Pages 169-176
Current-Induced Charges and Hydrogen Species Distributions in MOS Silicon Dioxide Films....Pages 177-186
Front Matter....Pages 187-188
The Structure of the Si / SiO 2 Interface: A Review....Pages 189-198
Front Matter....Pages 187-188
The Stoichiometry and Structure of the Si/SiO 2 Interface: Ion Scattering Studies....Pages 199-200
Scanning Tunneling Microscopy and Spectroscopy of Silicon Dangling Bond Defects....Pages 201-210
The Microstructure of SiO 2 -Si(100) Interfaces Investigated by XPS and HRTEM....Pages 211-218
Microscopic Structure Of The SiO 2 /Si Interface....Pages 219-225
ARXPS Analysis of Si-SiO 2 -Interfaces....Pages 227-233
Dependence of SiO 2 /Si Interface Structures on Oxidation Process....Pages 235-241
The Effect of Electrostatic Screening on Energy Positions of Spectra Near SiO 2 /Si Interfaces....Pages 243-250
A Physical Model for the Observed Dependence of the Metal-Semiconductor Work Function Difference on Substrate Orientation....Pages 251-258
Theoretical Calculations of the Electronic Structure in the Si-SiO 2 Systems....Pages 259-269
Theory of Defects in the MOS System....Pages 271-283
Front Matter....Pages 285-285
Nature of Radiation-Induced Point Defects in Amorphous SiO 2 and their Role in SiO 2 -ON-Si Structures....Pages 287-297
Chemical and Structural Features of Inherent and Process-Induced Defects in Oxidized Silicon....Pages 299-308
Chemical Kinetics of Hydrogen and P b Centers....Pages 309-318
Electronic and Optical Properties of Silicon Dangling-Bond Defects at the Si-Sio 2 Interface....Pages 319-326
Transient Spectroscopy on Individual Interface Traps in Mosfets....Pages 327-333
Observation of “1/f-Noise States” in Conductance Measurements on Mos Structures....Pages 335-340
The Gate-Voltage Dependence of Trapping Into Individual Si:SiO 2 Interface States....Pages 341-347
Step Heights of Switching Effects of Single Interface Traps in Mosfets....Pages 349-356
Low Temperature Conductance of Si-MOS Devices after Hot Carrier Degradation....Pages 357-364
The Neutral Level of Si-SO 2 Interface States....Pages 365-371
Front Matter....Pages 285-285
Mos Tunneling Rate and Interface State Capture Cross-Section....Pages 373-380
Defect Transformation Process at SiO 2 /Si Interfaces....Pages 381-388
Front Matter....Pages 389-389
Preoxidation Surface Treatments in Thermal Oxidation of Silicon....Pages 391-400
The Si-SiO 2 Interface Roughness: Causes and Effects....Pages 401-411
Defects and Impurities in SiO 2 Interface for Oxides Prepared Using Superclean Methods....Pages 413-419
The Effect of Chemical Cleaning on the Kinetics of Thermal Oxidation....Pages 421-428
Studies of Anhydrous HF Preoxidation Treatment of Silicon Surfaces....Pages 429-436
The Influence of the Si-Substrate Characteristics on the Quality of Poly-Si and Al Gated Mos Oxides....Pages 437-444
Dielectric Breakdown of SiO 2 Grown on Rough Si Surfaces....Pages 445-452
Effects of Deionized Water Rinses on Gate Oxide Leakage Currents....Pages 453-457
Oxidation-Induced Defects and Effects in Silicon During Low Thermal-Budget Processing....Pages 459-468
Implications of Oxidation Models on the Point Defect Behavior in the Silicon Substrate....Pages 469-476
Interstitial Fluxes During Silicon Oxidation....Pages 477-484
Front Matter....Pages 485-486
Charge Trapping in SiO 2 ....Pages 487-496
Historical Perspective on Tunneling in SiO 2 ....Pages 497-507
Hot Electron Transport in Silicon Dioxide....Pages 509-518
Ion Implantation and Ionizing Radiation Effects in Thermal Oxides....Pages 519-527
Interface and Bulk Trapping Centers in Low Temperature Ion-Beam Sputtered Silicon Dioxide Films....Pages 529-536
Interface Improvement by Hot Carrier Degradation — Forming Gas Annealing Cycle....Pages 537-543
Effects if X Irradiation and High Field Electron Injection on the Properties of Rapid Thermal Oxides....Pages 545-552
Back Matter....Pages 553-556