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دانلود کتاب Scanning Electron Microscopy and X-Ray Microanalysis

دانلود کتاب میکروسکوپ الکترونی روبشی و میکروآنالیز اشعه ایکس

Scanning Electron Microscopy and X-Ray Microanalysis

مشخصات کتاب

Scanning Electron Microscopy and X-Ray Microanalysis

ویرایش: 4 
نویسندگان: , , , , ,   
سری:  
ISBN (شابک) : 149396674X, 9781493966745 
ناشر: Springer 
سال نشر: 2017 
تعداد صفحات: 554 
زبان: English 
فرمت فایل : PDF (درصورت درخواست کاربر به PDF، EPUB یا AZW3 تبدیل می شود) 
حجم فایل: 68 مگابایت 

قیمت کتاب (تومان) : 54,000



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توضیحاتی در مورد کتاب میکروسکوپ الکترونی روبشی و میکروآنالیز اشعه ایکس


توضیحاتی درمورد کتاب به خارجی

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners ― engineers, technicians, physical and biological scientists, clinicians, and technical managers ― will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD).

With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal.
  • Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers
  • Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results
  • Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements
  • Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.
  • Includes case studies to illustrate practical problem solving
  • Covers Helium ion scanning microscopy
  • Organized into relatively self-contained modules – no need to "read it all" to understand a topic
  • Includes an online supplement―an extensive "Database of Electron–Solid Interactions"―which can be accessed on SpringerLink, in Chapter 3


فهرست مطالب

Front Matter ....Pages I-XXIII
Electron Beam—Specimen Interactions: Interaction Volume (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 1-14
Backscattered Electrons (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 15-28
Secondary Electrons (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 29-37
X-Rays (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 39-63
Scanning Electron Microscope (SEM) Instrumentation (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 65-91
Image Formation (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 93-110
SEM Image Interpretation (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 111-121
The Visibility of Features in SEM Images (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 123-131
Image Defects (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 133-146
High Resolution Imaging (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 147-164
Low Beam Energy SEM (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 165-172
Variable Pressure Scanning Electron Microscopy (VPSEM) (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 173-185
ImageJ and Fiji (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 187-193
SEM Imaging Checklist (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 195-200
SEM Case Studies (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 201-207
Energy Dispersive X-ray Spectrometry: Physical Principles and User-Selected Parameters (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 209-234
DTSA-II EDS Software (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 235-264
Qualitative Elemental Analysis by Energy Dispersive X-Ray Spectrometry (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 265-287
Quantitative Analysis: From k-ratio to Composition (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 289-307
Quantitative Analysis: The SEM/EDS Elemental Microanalysis k-ratio Procedure for Bulk Specimens, Step-by-Step (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 309-339
Trace Analysis by SEM/EDS (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 341-357
Low Beam Energy X-Ray Microanalysis (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 359-380
Analysis of Specimens with Special Geometry: Irregular Bulk Objects and Particles (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 381-411
Compositional Mapping (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 413-439
Attempting Electron-Excited X-Ray Microanalysis in the Variable Pressure Scanning Electron Microscope (VPSEM) (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 441-459
Energy Dispersive X-Ray Microanalysis Checklist (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 461-470
X-Ray Microanalysis Case Studies (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 471-479
Cathodoluminescence (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 481-489
Characterizing Crystalline Materials in the SEM (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 491-515
Focused Ion Beam Applications in the SEM Laboratory (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 517-528
Ion Beam Microscopy (Joseph I. Goldstein, Dale E. Newbury, Joseph R. Michael, Nicholas W. M. Ritchie, John Henry J. Scott, David C. Joy)....Pages 529-539
Back Matter ....Pages 541-550




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