Nanofabrication by Ion-Beam Sputtering : Fundamentals and Applications

 Content: Front Cover; Dedication; Contents; Foreword; Preface; Chapter 1 --
 Elements of Sputtering Theory; Chapter 2 --
 Sputter-Ripple Formation on Flat and Rough Surfaces: A Case Study with Si; Chapter 3 --
 Low-Energy Ion-Induced Pattern Formation in Si-Ge Alloy; Chapter 4 --
 Patterning of Ionic Insulator Surfaces with Low-Energy Ion Beams; Chapter 5 --
 Nanostructures on Thin Films by keV Ion Beams; Chapter 6 --
 Surface Nanopatterns on Si(100) by Normal-Incidence Ion Sputtering with Simultaneous Metal Incorporation; Chapter 7 --
 Kinetic Monte Carlo Simulations of Low-Energy Ion-Induced Surface Patterning Chapter 8 --
 From Cascades to Patterns: A Monte Carlo ApproachChapter 9 --
 Understanding Surface Patterning by Lattice Gas Models; Chapter 10 --
 Applications of Ion Beam Produced Patterned Substrates in Plasmonics; Color Insert; Back Cover
 Abstract:             Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attractive. This book reviews various fascinating results, understand the underlying physics of ion induced pattern formation, to highlight the potential applications of the patterned surfaces, and to explore the patterning behavior by different irradiation