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دانلود کتاب Microelectronics Technology. Polymers for Advanced Imaging and Packaging
دانلود کتاب فناوری میکروالکترونیک. پلیمرها برای تصویربرداری پیشرفته و بسته بندی
مشخصات کتاب
Microelectronics Technology. Polymers for Advanced Imaging and Packaging
ویرایش: نویسندگان: Elsa Reichmanis, Christopher K. Ober, Scott A. MacDonald, Takao Iwayanagi, and Tadatomi Nishikubo (Eds.) سری: ACS Symposium Series 614 ISBN (شابک) : 9780841233324, 0841233322 ناشر: American Chemical Society سال نشر: 1995 تعداد صفحات: 560 زبان: English فرمت فایل : PDF (درصورت درخواست کاربر به PDF، EPUB یا AZW3 تبدیل می شود) حجم فایل: 65 مگابایت
قیمت کتاب (تومان) : 41,000
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توضیحاتی در مورد کتاب فناوری میکروالکترونیک. پلیمرها برای تصویربرداری پیشرفته و بسته بندی
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توضیحاتی درمورد کتاب به خارجی
Content: An analysis of process issues with chemically
amplified positive resists / O. Nalamasu, A.G. Timko, Elsa
Reichmanis, F.M. Houlihan, Anthony E. Novembre, R. Tarascon, N.
Münzel, and S.G. Slater --
The annealing concept for environmental stabilization of
chemical amplification resists / Hiroshi Ito, Greg Breyta,
Donald C. Hofer, and R. Sooriyakumaran --
Structure-property relationship of acetal-and ketal-blocked
polyvinyl phenols as polymeric binder in two-component positive
deep-UV photoresists / C. Mertesdorf, N. Münzel, P. Falcigno,
H.J. Kirner, B. Nathal, H.T. Schacht, R. Schulz, S.G. Slater,
and A. Zettler --
Lithographic effects of acid diffusion in chemically amplified
resists / C.A. Mack --
Acid diffusion in chemically amplified resists : the effect of
prebaking and post-exposure baking temperature / Jiro Nakamura,
Hiroshi Ban, and Akinobu Tanaka --
Correlation of the strength of photogenerated acid with the
post-exposure delay effect in positive-tone chemically
amplified deep-UV resists / F.M. Houlihan, E. Chin, O.
Nalamasu, J.M. Kometani, and R. Harley --
Following the acid : effect of acid surface depletion on
phenolic polymers / James W. Thackeray, Mark D. Denison,
Theodore H. Fedynyshyn, Doris Kang, and Roger Sinta --
Water-soluble onium salts: new class of acid generators for
chemical amplification positive resists / Toshio Sakamizu,
Hiroshi Shiraishi, and Takumi Ueno --
Photoacid and photobase generators: arylmethyl sulfones and
benzhydrylammonium salts / J.E. Hanson, K.H. Jensen, N.
Gargiulo, D. Motta, D.A. Pingor, Anthony E. Novembre, David A.
Mixon, J.M. Kometani, and C. Knurek --
Functional imaging with chemically amplified resists /
Alexander M. Vekselman, Chunhao Zhang, and Graham D. Darling
--
Hydrogen bonding in sulfone- and N-methylmaleimide-containing
resist polymers with hydroxystyrene and acetoxystyrene :
two-dimensional NMR studies / Sharon A. Heffner, Mary E.
Galvin, Elsa Reichmanis, Linda Gerena, and Peter A. Mirau
--
NMR investigation of miscibility in
novolac-poly(2-methyl-1-pentene sulfone) resists / Sharon A.
Heffner, David A. Mixon, Anthony E. Novembre, and Peter A.
Mirau --
Styrylmethylsulfonamides : versatile base-solubilizing
components of photoresist resins / Thomas X. Neenan, E.A.
Chandross, J.M. Kometani, and O. Nalamasu --
4-Methanesulfonyloxystyrene : a means of improving the
properties of tert-butoxycarbonyloxystyrene-based polymers for
chemically amplified deep-UV resists / J.M. Kometani, F.M.
Houlihan, Sharon A. Heffner, E. Chin, and O. Nalamasu --
Dienone-phenol rearrangement reaction : design pathway for
chemically amplified photoresists / Ying Jiang, John Maher, and
David Bassett --
Single-layer resist for ArF excimer laser exposure containing
aromatic compounds / Tohru Ushirogouchi, Takuya Naito, Koji
Asakawa, Naomi Shida, Makoto Nakase, and Tsukasa Tada --
Design considerations for 193-nm positive resists / Robert D.
Allen, I-Y. Wan, Gregory M. Wallraff, Richard A. DiPietro,
Donald C. Hofer, and Roderick R. Kunz --
Top-surface imaged resists for 193-nm lithography / Roderick R.
Kunz, Susan C. Palmateer, Mark W. Horn, Anthony R. Forte, and
Mordechai Rothschild --
Silicon-containing block copolymer resist materials / Allen H.
Gabor and Christopher K. Ober --
A top-surface imaging approach based on the light-induced
formation of dry-etch barriers / U. Schaedeli, M. Hofmann, E.
Tinguely, and N. Münzel --
Plasma-developable photoresist system based on polysiloxane
formation at the irradiated surface : a liquid-phase deposition
method / Masamitsu Shirai, Norihiko Nogi, Masahiro Tsunooka,
and Takahiro Matsuo --
New polysiloxanes for chemically amplified resist applications
/ J.C. van de Grampel, R. Puyenbroek, A. Meetsma, B.A.C.
Rousseeuw, and E.W.J.M. van der Drift --
Environmentally friendly polysilane photoresists / James V.
Beach, Douglas A. Loy, Yu-Ling Hsiao, and Robert M. Waymouth
--
Fluoropolymers with low dielectric constants : triallyl
ether-hydrosiloxane resins / Henry S.-W. Hu, James R. Griffith,
Leonard J. Buckley, and Arthur W. Snow --
Photophysics, photochemistry, and intramolecular charge
transfer of polyimides / Masatoshi Hasegawa, Yoichi Shindo, and
Tokuko Sugimura --
Structure, properties, and intermolecular charge transfer of
polyimides / Masatoshi Hasegawa, Junichi Ishii, Takahumi
Matano, Yoichi Shindo, Tokuko Sugimura, Takao Miwa, Mina
Ishida, Yoshiaki Okabe, and Akio Takahashi --
Application of polyisoimide as a polyimide precursor to polymer
adhesives and photosensitive polymers / Amane Mochizuki and
Mitsuru Ueda --
Polyimide nanofoams prepared from styrenic block copolymers /
J.L. Hedrick, T.P. Russell, C. Hawker, M. Sanchez, K. Carter,
Richard A. DiPietro, and R. Jerome --
Internal acetylene unit as a cross-link site for polyimides /
Tsutomu Takeichi and Masaaki Tanikawa --
Vapor-depositable polymers with low dielectric constants / J.A.
Moore, Chi-I Lang, T.-M. Lu, and G.-R. Yang --
Plasma polymerization in direct current glow: characterization
of plasma-polymerized films of benzene and fluorinated
derivatives / Toshihiro Suwa, Mitsutoshi Jikei, Masa-aki
Kakimoto, and Yoshio Imai --
Syntheses and properties of allylated
poly(2,6-dimethyl-1,4-phenylene ether) / Yoshiyuki Ishii,
Hiroji Oda, Takeshi Arai, and Teruo Katayose --
Synthesis and photochemistry of a
2,6-dialkoxyanthracene-containing, side-chain-substituted
liquid-crystalline polymer / David Creed, Charles E. Hoyle,
Anselm C. Griffin, Ying Liu, and Surapol Pankasem --
Hybrid polyimide-polyphenylenes by the Diels-Alder
polymerization between biscyclopentadienones and
ethynyl-terminated imides / Uday Kumar and Thomas X. Neenan
--
Polysiloxane thermoplastic polyurethane modified epoxy resins
for electronic application / Tsung-Han Ho and Chun-Shan
Wang.
