Laser Annealing of Semiconductors

Content: 
CONTRIBUTORS, Page ii
Front Matter, Page iii
Copyright, Page iv
List of Contributors, Pages ix-x
Preface, Page xi
Chapter 1 - Introduction, Pages 1-14, J.M. POATE, JAMES W. MAYER
Chapter 2 - Crystallization Processes, Pages 15-42, FRANS SPAEPEN, DAVID TURNBULL
Chapter 3 - Fundamentals of Energy Deposition, Pages 43-74, MARTIN F. VON ALLMEN
Chapter 4 - Heat Flow Calculations, Pages 75-109, PIETRO BAERI, SALVATORE UGO CAMPISANO
Chapter 5 - Supersaturated Alloys, Solute Trapping, and Zone Refining, Pages 111-146, C.W. WHITE, B.R. APPLETON, S.R. WILSON
Chapter 6 - Microstructure and Topography, Pages 147-201, A.G. CULLIS
Chapter 7 - Epitaxy by Pulsed Annealing of Ion-Implanted Silicon, Pages 203-245, GAETANO FOTI, EMANUELE RIMINI
Chapter 8 - Epitaxy of Deposited Si, Pages 247-280, J.M. POATE, J.C. BEAN
Chapter 9 - Surface Properties of Laser-Annealed Semiconductors, Pages 281-324, D.M. ZEHNER, C.W. WHITE
Chapter 10 - Solid Phase Regrowth, Pages 325-381, J.F. GIBBONS, T.W. SIGMON
Chapter 11 - Compound Semiconductors, Pages 383-438, J.S. WILLIAMS
Chapter 12 - Silicides and Metastable Phases, Pages 439-478, MARTIN F. VON ALLMEN, S.S. LAU
Chapter 13 - Factors Influencing Applications, Pages 479-557, C. HILL
Index, Pages 559-564