Handbook of Ion Beam Processing Technology - Principles, Deposition, Film Modification and Synthesis

MATERIALS SCIENCE AND PROCESS TECHNOLOGY SERIES......Page 3
HANDBOOK OF ION BEAM PROCESSING TECHNOLOGY......Page 4
Contributors......Page 8
Contents......Page 12
1 Perspective on Past, Present and Future Uses of Ion Beam Technology......Page 20
Part I Ion Beam Technology......Page 26
2 Gridded Broad-Beam Ion Sources......Page 27
3 ECR Ion Sources......Page 40
4 Hall Effect Ion Sources......Page 58
5 Ionized Cluster Beam (ICB) Deposition and Epitaxy......Page 77
Part II Sputtering Phenomena......Page 96
6 Quantitative Sputtering......Page 97
7 Laser-Induced Fluorescence as a Tool for the Study of Ion Beam Sputtering......Page 131
8 Characterization of Atoms Desorbed from Surfaces by Ion Bombardment Using Multiphoton Ionization Detection......Page 147
9 The Application of Postionization for Sputtering Studies and Surface or Thin Film Analysis......Page 164
Part III Film Modificaton and Synthesis......Page 188
10 The Modification of Films by Ion Bombardment......Page 189
11 Control of Film Properties by lon-Assisted Deposition Using Broad Beam Sources......Page 213
12 Etching wiith Directed Beams......Page 238
13 Film Growth Modification by Concurrent Ion Bombardment: Theory and Simulation......Page 260
14 Interface Structure and Thin Film Adhesion......Page 298
15 Modification of Thin Films by Off-Normal Incidence Ion Bornbardment......Page 319
16 Ion Beam Interactions with Pollymer Surfaces......Page 334
17 Topography: Texturing Effects......Page 357
18 Methods and Techniques of Ion Beam Processes......Page 381
19 lon-Assisted Dielectric and Optical Coatings......Page 392
20 Diamond and Diamond-like Thin Films by Ion Beam Techniques......Page 434
Index......Page 454