Application of Particle and Laser Beams in Materials Technology

Front Matter....Pages i-xi
Front Matter....Pages xiii-xiii
Fundamental Aspects of Ion Electron Interactions....Pages 1-20
Fundamentals of Ion-Solid Interactions: Atomic Collisions....Pages 21-36
Excitation and Ionization In Fast Ion-Atom Collisions Due to Projectile — Electron — Target — Electron Interactions....Pages 37-52
Radiation Induced Point Defects and Diffusion....Pages 53-76
High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams....Pages 77-94
Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties....Pages 95-112
Front Matter....Pages 113-113
An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds....Pages 115-131
Depth Profiling in Combination with Sputtering....Pages 133-150
A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflector....Pages 151-158
Thermal He Atom Scattering for the Study of Surface Systems: K on Si(001)....Pages 159-165
Experimental and Monte-Carlo Simulation Studies of the Surface Concentration Changes in ZrO 2 under Ion Bombardment....Pages 167-173
Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics....Pages 175-181
Front Matter....Pages 183-183
The Raman Approach to Materials Science....Pages 185-217
Laser-Material Interaction. Plasma Formation and Applications....Pages 219-235
Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids....Pages 237-258
 In Situ Laser Beam Probes for Semiconductor Processing....Pages 259-267
Laser Deposition and Patterning of Diamond Films....Pages 269-280
Laser-Raman Spectroscopy of Some Lanthanide/Hgl 2 Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL)....Pages 281-284
Front Matter....Pages 285-285
Accelerators in Materials Research....Pages 287-300
Application of Elastic Recoil Detection in Materials Analysis....Pages 301-321
Front Matter....Pages 285-285
Applications of High Energy Ion Scattering in Materials Science....Pages 323-340
High Energy Heavy Ion RBS, ERDA and Channelling....Pages 341-357
Some New Detection Techniques for Light-Ion Scattering Analysis....Pages 359-374
Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na....Pages 375-386
Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis....Pages 387-398
Thin Layer Activation in Materials Technology....Pages 399-413
Optimum Industrial Application of the Thin Layer Activation Technique....Pages 415-426
Ion Beam Analysis of Glasses — Industrial Applications....Pages 427-435
Nuclear Reaction Analysis of Corroded Glass Surfaces....Pages 437-442
Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials....Pages 443-461
Non-Destructive Analysis Of American Gold Jewellery Items By PIXE, RBS and PIGE....Pages 463-470
Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems....Pages 471-476
Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips....Pages 477-484
Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium....Pages 485-492
Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence....Pages 493-500
Modern Technological Projects with High Power Electron Beams....Pages 501-512
Computer-Aided Design of Technological Electron-Optical Systems....Pages 513-524
Front Matter....Pages 525-525
Ion Beam Mixing....Pages 527-555
Materials Modification Using Electron Beams....Pages 557-580
Deposition and Etching Mechanisms in Plasma Thin Film Processes....Pages 581-593
Front Matter....Pages 525-525
Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation....Pages 595-602
SIMOX Thin Films. Structural and Electrical Characterisation using FTIR Spectroscopy....Pages 603-612
The Key Role of Electron Beams in IC Technology....Pages 613-621
Cadmium Sulphide Microcrystallite-Doped Silicon Dioxide Thin Films Prepared by RF-Sputtering: Growth and Physical Characterisation....Pages 623-629
Front Matter....Pages 631-631
Synchrotron Radiation Sources for Materials Technology....Pages 633-651
Photoemission and EXAFS Study of Na on 2H-TaS 2 ....Pages 653-660
Characterisation of Nearly Stoichiometric Buried Si x N y Films with EXAFS and NEXAFS....Pages 661-668
Back Matter....Pages 669-678