1965 Transactions of the Third International Vacuum Congress. 28 Jun–2 July 1965, Stuttgart, Germany

Content: 
Front Matter, Page iii
Copyright, Page iv
A new technique for producing epitaxial silicon layers using ultra-thin alloy zones, Pages 295-299, J D Filby, S Nielsen
“Perfect epitaxy” of silicon films on silicon as seen in large-area X-ray topographs, Pages 301-308, G H Schwuttke
Epitaxial growth of Si on Si in ultra-high vacuum, Pages 309-311, H Widmer
évaporation de permalloy par bombardement électronique, Pages 313-315, P Leduc
Thin film semiconductors, Pages 317-327, H F Mataré, J J Grossman
Some experiments in the reactive evaporation of tantalum oxide, Pages 329-331, K Taylor
Preparation of high mobility thin films of indium antimonide, Pages 333-341, C Juhasz, J C Anderson
Thermal shock effects in quartz crystal microbalances, Pages 343-346, M T Thomas, J A Dillon Jr
Weighing at low pressures, Pages 347-349, J A Poulis, C H Massen
Impact activated sorption as a means for gas incorporation in sputtered thin films, Pages 351-357, E Kay, H F Winters
Thin-film hafnium-hafnium oxide capacitors for high temperature operation, Pages 359-361, F Huber, W Witt, W Y Pan
über die Aggregation von Silber- und Goldaufdampfschichten, die auf Kohlefolien erhöhter Temperatur im Ultrahochvakuum niedergeschlagen wurden, Pages 363-365, K J Hanszen
Pumpzeitberechnung von Vakuumanlagen bei variabler Wandtemperatur, Pages 369-372, Th Kraus
Design considerations for vacuum systems with built-in getter ion and sublimation pumps, Pages 373-376, R Zaphiropoulos, D de Taddeo
Speed measuring of ion getter pumps by the “three-gauge” method, Pages 377-380, D F Munro, T Tom
The measurement of water vapour pressure in vacuum systems using a quartz crystal oscillator, Pages 381-392, H H A Bath, J S Olejniczak, W Steckelmacher
Charakteristik von Pumpsystemen für grosse Wasserdampfmengen unter Vakuum unter Anwendung von Kondensation und Kompression des Wasserdampfes, Pages 393-395, F Fauser
Eine gepulste Hochfrequenz-Entladung als Gasumwälzpumpe, Pages 397-402, K Eidmann, Walcher W, K H Wiesemann
Die Anwendung des Kryopumpenprinzips zur Verkürzung der Pumpzeiten in Vakuumkammern, Pages 403-406, M le Mahieu
The effect of non-condensable gas pressure on the evaporation rate in a short path distillation unit, Pages 407-421, M A Baker, J S Olejniczak
Modulated molecular beam apparatus for studies of atomic interactions with surfaces, Pages 425-429, I Dalins
Controlled hydrogen partial pressure in a field ion microscope, Pages 431-439, E W Müller, S Nakamura, S B McLane, O Nishikawa
The chemisorption of oxygen on polycrystalline tungsten, Pages 441-442, J H Singleton
Messung von Adsorptionsisothermen mit Schwingquarzen, Pages 443-446, H L Eschbach
Adsorption isotherms for hydrogen, deuterium, helium, argon, neon, oxygen and nitrogen on molecular sieve 5A at 77°K, Pages 447-450, J R Bailey
Sorption von Wasserstoff an kondensierten Titanschichten bei niedrigen Drücken, Pages 451-455, G F Iwanovski, A T Schirjaev
A study of a sorption process, Pages 457-464, H Ehlers
über die Bestimmung der Haftwahrscheinlichkeit von Gasen an rienen Metalloberflächen, Pages 465-471, N Hansen, W Littman
Anwendung des Omegatrons mit schnellem Elektrometerverstärker zur Untersuchung von Desorptionsvorgängen, Pages 473-474, A Barz
Untersuchung von Halbleiteroberflächen durch Desorptionsspektroskopie, Pages 475-479, Ch Kleint, W Moldenhauer
Gas desorption by synchrotron radiation in storage rings, Pages 481-485, M Bernardini
Die mittlere Verweilzeit und Haftwahrscheinlichkeit von Kohlendioxyd an Eisen, Pages 487-489, B Langenbeck, F J Schittko
Measurement of small ion currents in a mass spectrometer with a scintillation detector, Pages 493-496, H W Werner, H A M de Grefte
High sensitive D.C. split-magnetron ionization gauge, Pages 497-498, D Toš;i, B Č;obi
Utilization of omegatron type mass spectrometer for the analysis of release gases and hydrolysis gases from alkali fluorides samples at high temperature, Pages 499-503, G Trevisan, S Pizzini
The stability of omegatron sensitivity for different electrode materials, Pages 505-507, S Pytkowski, P Szwemin
Theoretische Grundlagen und experimentelle Ergebnisse einer neuen Methode der Partialdruckmessung für Vakuumanlagen, Pages 509-515, J Neubert
Vacuum chromatography, Pages 517-522, P F Váradi
A two-chamber ionization gauge, Pages 523-526, E W Blauth, G Venus
A cycloidal path mass spectrometer with wirewound electric field structure, Pages 527-533, D Andrew
Electrochemical vacuum gauges, Pages 535-541, E Kansky
The electron-single-scatter gauge — a new vacuum gauge for the range from 10−5 torr to 1 torr, Pages 543-554, B W Schumacher, E Aruja, H R Falckenberg
CONTENTS OF VOLUME 1, Page 555
CONTENTS OF VOLUME 2: PART I, Pages 555-557